Regular Article

A Monte Carlo calculation of the secondary electron emission in the backward direction from a SiO₂ macro-capillary

¹ Hefei National Laboratory for Physical Sciences at Microscale and Department of Physics, University of Science and Technology of China, Hefei 230026, Anhui, P.R. China
² Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Hefei 230026, Anhui, P.R. China
³ Institute for Nuclear Research, Hungarian Academy of Sciences (ATOMKI), 4026 Debrecen, Hungary
⁴ Department of Physics and Nanomed Labs, Università di Genova, Via Dodecaneso 33, 16146 Genova, Italy
⁵ Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, P.R. China
⁶ Center for Materials Research by Information Integration (CMI2), Research and Services Division of Materials Data and Integrated System (MaDIS), National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

^a e-mail: tokesi@atomki.mta.hu

Received: 27 May 2019
Received in final form: 20 December 2019
Published online: 20 February 2020

Abstract

A Monte Carlo calculation of the secondary electron emission from a SiO₂ macro-capillary in the backward direction induced by electron irradiation is presented with the aim to understand transmission guiding of a scanning electron beam through a borosilicate glass macro-capillary. The theoretical modeling of electron transport in SiO₂ capillary incorporates the elastic, inelastic and phonon scatterings, resulting, respectively, from the interactions with nucleus, electrons and phonons. The influence on electron inelastic scattering by the insulator bandgap is also considered. In this work a simplified approach has been employed to deal with the charging of the internal wall of the capillary and it is found that at a glancing incident angle, the secondary electrons are mostly originated from the top surface.