Eur. Phys. J. D (2013) 67: 125
https://doi.org/10.1140/epjd/e2013-30500-5

Regular Article

Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

National Key Laboratory of Science and Technology on Tunable laser, Harbin Institute of Technology, Harbin 150001, P.R. China

^a e-mail: hgdxq@126.com

Received: 12 August 2012
Received in final form: 8 April 2013
Published online: 27 June 2013

Abstract

The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe¹⁰⁺ 4d⁸-4d⁷5p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.