https://doi.org/10.1140/epjd/e2010-00192-6
Extreme-ultraviolet emissivity from Xe8+ to Xe12+ by using a detailed line-by-line method
Department of Physics, College of Science, National University of Defense Technology, Changsha Hunan, 410073, P.R. China
Corresponding author: a jiaolongzeng@hotmail.com
Received:
17
December
2009
Revised:
4
May
2010
Published online:
27
July
2010
A theoretical model has been developed to calculate the emissivity of low density
xenon plasmas (from Xe8+ to Xe12+) by employing a detailed line
accounting formalism. A complete set of atomic data
such as transition probabilities for electric (magnetic) dipole
and quadruple E1, E2, M1 and M2 and electron impact excitation
collision strength, which is accurate to fine-structure level,
was calculated using a full configuration interaction formalism
and was used to solve the rate equation which determines the
population of different levels. Detailed results are given for
pure Xe10+ ion, which is essential for extreme-ultraviolet
emission at 13.5 nm, and for low density plasmas (the electron density
was taken to be 1012 cm-3) at temperatures of 30, 45, 55, 65
and 75 eV. The fraction of different ionization stages was obtained by a
completely coupled rate equation from neutral atom to Xe20+ by using
a detailed configuration accounting method. The results show that the
emissivity of the dipole forbidden lines of transition array
4s24p64d75s 4s24p64d8 of Xe10+
is very sensitive to the temperature, which should be a useful tool to
diagnose the temperature in EBIT plasmas.
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2010