Eur. Phys. J. D 54, 281-286 (2009)
https://doi.org/10.1140/epjd/e2009-00037-5

N–O mix optimisation in low energy dense DC glow surface Ti conditioning

¹ Instituto Tecnológico de Toluca, AP 890, Toluca, Estado de México, México
² Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 DF, México

Corresponding author: ^a regulo.lopez@inin.gob.mx

Received: 3 November 2008
Revised: 17 December 2008
Published online: 6 February 2009

Abstract

Samples of pure titanium have been treated by means a plasma immersed ion implantation (PIII) process in a DC glow discharge in pure oxygen and in different nitrogen-oxygen mixtures. In contrast with conventional voltage supply based glow PIII, the present study has been conducted with a novel specifically designed high current supply which allows a high electron density to be kept constant, regardless of gas pressure variations, within the operational ranks. Thus, the acquired sample characteristics can be more clearly ascribed to the chemical composition of the mixture. One stratified TiO₂ (rutile) and TiN_0.26 layer was identified from XRD and Raman spectroscopy, both of these compounds reputedly being highly biocompatible. The superficial hardness of the samples was improved up to more than five times that of the untreated reference sample, namely, ∼1600 Vickers microhardness (10 g load) thanks to a 2–6 μm deep implanted layer. These optimal results have been obtained from an 80% nitrogen 20% oxygen mixture at 1×10^-2 torr. Furthermore, with this gas proportion, the best roughness finishing of the sample set was accomplished, which can be relevant for biocompatible applications.