https://doi.org/10.1007/s100530170200
Influence of laser pulse width on absolute EUV-yield from Xe-clusters
1
Max-Born-Institut, Max-Born-Str. 2a, 12489 Berlin, Germany
2
Institute for Physical Research, 378410 Ashtarak-2, Armenia
Corresponding author: a schnuerer@mbi-berlin.de
Received:
11
January
2001
Revised:
27
March
2001
Published online: 15 June 2001
Using 50 fs (
W/cm2) and 2 ps
(
W/cm2) pulses from a Ti:Sa multi-TW
laser at 800 nm wavelength large Xe-clusters (
atoms per cluster) have been excited. Absolute yield measurements
of EUV-emission in a wavelength range between 10 nm and 15 nm in
combination with cluster target variation were carried out. The
ps-laser pulse has resulted in about 30% enhanced and spatially
more uniform EUV-emission compared to fs-laser excitation.
Circularly polarized laser light instead of linear polarization
results in enhanced emission which is probably caused by electrons
gaining higher energies by the polarization dependent optical
field ionization process. An absolute emission efficiency at 13.4
nm of up to 0.8% in 2π sr and 2.2% bandwidth has been
obtained.
PACS: 52.38.Ph – X-ray, γ-ray and particle generation / 52.50.Jm – Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.) / 36.40.Vz – Optical properties of clusters
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2001
