https://doi.org/10.1140/epjd/s10053-024-00884-w
Regular Article - Plasma Physics
Influence of bias voltage rise time, pressure and magnetic field on the boundary layer time evolution of a thermal collisional magnetized plasma in plasma immersion ion implantation
1
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
2
Department of Basic Sciences and Engineering, Borujerd Branch, Islamic Azad University, Borujerd, Iran
Received:
25
September
2023
Accepted:
17
June
2024
Published online:
2
July
2024
The formation and temporal evolution of the plasma boundary layer in plasma immersion ion implantation is investigated in the presence of a magnetic field. It is assumed that the ions are thermalized. When a high-voltage pulse with a ramp function is applied to a target immersed in plasma, a positive space charge is formed and expanded around it. The rise time of the ramp function of the pulse voltage influences the formation and expansion of the plasma boundary layer near the target. The time evolution of the ion current density, ion kinetic energy and ion incident angle as well as the time evolution of the positive space charge and the boundary layer thickness are studied as a functions of the magnetic field, neutral gas pressure and rise time of the ramp function. Our findings show that the time dependency of the variables of the plasma boundary layer is more pronounced for a longer rise time.
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© The Author(s), under exclusive licence to EDP Sciences, SIF and Springer-Verlag GmbH Germany, part of Springer Nature 2024. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
