https://doi.org/10.1140/epjd/s10053-023-00592-x
Topical Review - Plasma Physics
Theory and molecular simulations of plasma sputtering, transport and deposition processes
1
GREMI CNRS – Université d’Orléans, BP6744, 14 Rue d’Issoudun, 45067, Orléans Cedex 2, France
2
SAFRAN Tech, CS 80112, Rue des jeunes Bois, Chateaufort, 78772, Magny-Les-Hameaux, France
a
pascal.brault@univ-orleans.fr
Received:
3
November
2022
Accepted:
2
January
2023
Published online:
1
February
2023
The present review provides an overview of the basic theory of sputtering with recent models, focusing in particular on sputtered atom energy distribution functions. Molecular models such as Monte-Carlo, kinetic Monte-Carlo, and classical Molecular Dynamics simulations are presented due to their ability to describe the various processes involved in sputter deposition at the atomic and molecular scale as required. The sputter plasma, the sputtering mechanisms, the transport of sputtered material and its deposition leading to thin film growth can be addressed using these molecular simulations. In all cases, the underlying methodologies and some selected mechanisms are highlighted.
© The Author(s), under exclusive licence to EDP Sciences, SIF and Springer-Verlag GmbH Germany, part of Springer Nature 2023. corrected publication 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
