Eur. Phys. J. D (2015) 69: 267
https://doi.org/10.1140/epjd/e2015-60413-0

Regular Article

Double electromagnetically induced transparency medium for quantum lithography beyond diffraction limit

¹ Physics Department, Adelphi University Garden City, New York 11530, USA
² Department of Mathematics, Al-Azhar University, Faculty of Science, P.O. Box 11754, Nasr City, Cairo, Egypt

^a e-mail: kie_osman@hotmail.com

Received: 16 July 2015
Received in final form: 28 September 2015
Published online: 3 December 2015

Abstract

A method to carry out the sub-wavelength lithography using a double electromagnetically induced transparency system is proposed here. In order to realize the sub-wavelength pattern, spatial modulation of the coupling and driving fields, which control the double EIT, is introduced. The proposal does not require entanglement of fields and can be conveniently implemented with existing techniques.