Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures

Thejaswini Halethimmanahally Chandrashekaraiah; Robert Bogdanowicz; Vladimir Danilov; Jan Schäfer; Jürgen Meichsner; Rainer Hippler

doi:10.1140/epjd/e2015-50675-9

2021 Impact factor 1.611

Atomic, Molecular, Optical and Plasma Physics

Eur. Phys. J. D (2015) 69: 142
https://doi.org/10.1140/epjd/e2015-50675-9

Regular Article

Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C₂H_m/N₂ (m = 2, 4, 6) gas mixtures

Thejaswini Halethimmanahally Chandrashekaraiah¹, Robert Bogdanowicz¹^,2, Vladimir Danilov¹, Jan Schäfer³, Jürgen Meichsner¹ and Rainer Hippler¹^a

¹ Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany
² Faculty of Electronics, Telecommunication and Informatics, Gdansk University of Technology, 11/12 G. Narutowicza Str., 80-233 Gdansk, Poland
³ Leibniz-Institut für Plasmaforschung und Technologie, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany

^a e-mail: hippler@physik.uni-greifswald.de

Received: 11 September 2014
Received in final form: 28 January 2015
Published online: 2 June 2015

Abstract

Organic polymer thin films have been deposited on Si(100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using different C₂H_m/N₂ (m = 2, 4, 6) gas mixtures. The deposited films were characterized by various spectroscopic techniques. Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS) revealed the chemical functional groups present in the films. The surface chemical compositions have been derived from X-ray photo electron spectroscopy (XPS). FT-IRRAS and XPS show the presence of sp, sp² and sp³ bonds of carbon and nitrogen. Various functional groups such as NH containing, saturated and unsaturated alkyl groups have been identified. Thin films obtained from C₂H₂/N₂ and C₂H₄/N₂ gas mixtures revealed a higher N/C ratio when compared to thin films obtained from C₂H₆/N₂. Thickness, refractive index and extinction coefficient were evaluated by spectroscopic ellipsometry (SE). Significant differences between the films obtained with different gas mixtures are observed.