Eur. Phys. J. D 60, 653-660 (2010)
https://doi.org/10.1140/epjd/e2010-00245-x

Characterization of an atmospheric pressure plasma jet for surface modification and thin film deposition

Institute of Experimental and Applied Physics, Christian-Albrechts-Universität zu Kiel, 24098 Kiel, Germany

Corresponding author: ^a kersten@physik.uni-kiel.de

Received: 12 May 2010
Revised: 29 July 2010
Published online: 28 September 2010

Abstract

In this paper, an experimental study is presented to characterize a commercially available atmospheric pressure plasma jet (APPJ) kINPen which can be used for local surface modification, e.g. changing the wettability as well as for thin film deposition with silicon-organic and metal-organic precursors to enhance scratch resistance or to lower the gas permeability. Characterization of the jet discharge has been carried out by three methods: (i) measurement of the energy influx from the jet plasma to a substrate by a calorimetric probe, (ii) spatial resolved investigation of the plasma beam by optical emission spectroscopy (OES) and (iii) observation of the plasma jet by video imaging. The deposited SiO_x and AlO_x films were analyzed by XPS measurements.