Eur. Phys. J. D 54, 173-177 (2009)
https://doi.org/10.1140/epjd/e2009-00085-9

Limited volume thin film deposition on geometrically complicated substrates

¹ University of South Bohemia, Department of Physics, Jeronýmova 10, 371 15 České Budějovice, Czech Republic
² Technical University of Liberec, Hálkova 6, 461 17 Liberec, Czech Republic

Corresponding author: ^a bartos-petr@seznam.cz

Received: 4 September 2008
Revised: 19 January 2009
Published online: 13 March 2009

Abstract

This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiO_x based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared.