Eur. Phys. J. D 46, 303-306 (2008)
https://doi.org/10.1140/epjd/e2007-00316-1

Growth of electron energies with ion beam injection in a double plasma device

Center of Plasma Physics, Tepesia, Kamrup, 782402 Assam, India

Corresponding author: ^a mishra.mrinal@rediffmail.com

Received: 6 July 2007
Revised: 10 September 2007
Published online: 23 November 2007

Abstract

This paper reports about the observed energy growth of both high and low energetic electron species in the target plasma region with the increase in plasma potential in the source region of a double plasma device. This situation can be correlated to the injection of an ion beam from source to target plasma region. Plasma is solely produced in the source region and a low-density diffuse plasma is generated in the target region by local ionization between the neutral gas and the high energetic electrons coming from the source region. The growth of electron energy is accompanied by a decrease in diffuse plasma density. It is observed that although energy of high energetic group increases with the injected beam energy, the diffuse plasma density falls due to their decreasing population.