https://doi.org/10.1140/epjd/e2007-00088-6
Photo-induced evolution of copper sheets from cluster molecules and its application to photolithographic copper patterning
Institute for Molecular Science (IMS), Okazaki, Japan
Corresponding author: a nishi@ims.ac.jp
Received:
24
July
2006
Revised:
16
November
2006
Published online:
24
May
2007
UV photoexcitation of (t-butylethynyl copper)24 cluster films induces segregation of the crystals into metallic and organic phases and leads to evolve the metallic sheets sandwiched by organic polymers. The growth of the metallic crystals in the plane of the photo-electromagnetic field is attributed due to plasmon-plasmon interaction among nanoparticles embedded in dielectric polymer matrices. The surface enhanced photochemical reaction of residual cluster molecules on the photon incident direction is expected to take an important role for joining the metal particles to produce a metallic sheet. We can apply this phenomenon for photolithographic copper pattern generation on a flexible base plate.
PACS: 68.37.-d – Microscopy of surfaces, interfaces, and thin films / 68.37.Lp – Transmission electron microscopy (TEM) (including STEM, HRTEM, etc.) / 68.55.-a – Thin film structure and morphology / 78.20.-e – Optical properties of bulk materials and thin films / 78.67.-n – Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures / 81.16.Rf – Nanoscale pattern formation
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2007
