Projectile charge and velocity effect on UO2 sputtering in the nuclear stopping regime
Centre Interdisciplinaire de Recherche Ions Laser CIRIL, UMR 6637 (CEA, CNRS, ENSICAEN, Université de Caen), B.P. 5133, 14070 Caen Cedex 05, France
Corresponding author: a firstname.lastname@example.org
Revised: 6 December 2005
Published online: 14 March 2006
Angular distributions and yields of uranium sputtered by slow highly charged Xeq+ ions (kinetic energy keV, charge state 1≤q≤25) from UO2 were measured by means of the catcher technique. A charge state effect on the sputtering process is observed at 8 and 81 keV. A deviation from a Acosθ shape (the linear collision cascade theory) is observed in case of Xeq+ impinging a UO2 surface at Ek=8 keV. Yields increase linearly with projectile charge state q thus clearly revealing the contribution of potential energy to the sputtering process. In addition, as the kinetic energy of a Xe10+ projectile decreases from 81 keV to 1.5 keV, a velocity effect is clearly observed on the angular distribution.
PACS: 34.90.+q – Other topics in atomic and molecular collision processes and interactions / 61.80.Jh – Ion radiation effects / 79.20.Rf – Atomic, molecular, and ion beam impact and interactions with surfaces
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2006