https://doi.org/10.1140/epjd/e2003-00171-0
Silicon-riched-oxide cluster assembled nanostructures formed by low energy cluster beam deposition
1
National Laboratory of Solid State Microstructures, Department of Materials Science and
Engineering, Nanjing University, Nanjing 210093, P.R. China
2
National Laboratory of Solid State Microstructures, Department of Physics, Nanjing
University, Nanjing 210093, P.R. China
Corresponding author: a sjhanmin@nju.edu.cn
Received:
10
September
2002
Published online:
3
July
2003
Free beam of silicon oxide nanoclusters is produced by a gas aggregation source from SiO precursor. Due to the disproportionation reaction during the condensation of SiO vapor the generated clusters are Si-riched. The clusters are collimated to be a fine beam and deposited on the substrate at room temperature. The microstructures of the cluster-based nanofilm are characterized by TEM. It is shown that with appropriate impacting parameters, Si-riched oxide nanofilms assembled from uniformly distributed isolated clusters can be obtained. And the clusters can self-organize into partially densely ordered packing within local domains. XPS spectra are taken to analyze the chemical components of the nanofilms. Photoluminescence from the Si-riched oxide nanofilms has also been observed.
PACS: 36.40.Sx – Diffusion and dynamics of clusters / 61.46.+w – Nanoscale materials: clusters, nanoparticles, nanotubes, and nanocrystals / 81.07.-b – Nanoscale materials and structures: fabrication and characterization
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2003
