https://doi.org/10.1140/epjd/e2003-00037-5
Quantum imaging, quantum lithography and the uncertainty principle
Department of Physics, University of Maryland, Baltimore
County, Baltimore MD 21250, USA
Corresponding author: a shih@umbc.edu
Received:
30
August
2002
Revised:
11
November
2002
Published online:
4
February
2003
One of the most surprising consequences of quantum mechanics is the entanglement of two or more distant particles. Even though we still have questions in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum imaging is one of the hot topics. Quantum imaging has many interesting features which are useful for different applications. For example, quantum imaging can be nonlocal, which is useful for secure two-dimensional information transfer. Quantum imaging can reach a much higher spatial resolution comparing with classical imaging, even beyond the diffraction limit, which is useful for lithography and other microsystem fabrication technology. It is not a violation of the uncertainty principle, however, a quantum mechanical multi-particle phenomenon.
PACS: 42.50.Dv – Nonclassical field states; squeezed, antibunched, and sub-Poissonian states; operational definitions of the phase of the field; phase measurements / 42.25.Fx – Diffraction and scattering
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2003
