https://doi.org/10.1007/s100530050287
Dependence of cluster ion emission from uranium oxide surfaces on the charge state of the incident slow highly charged ion
University of California, Lawrence Livermore National Laboratory, Livermore, CA 94551, USA
Corresponding author: a Hamza1@llnl.gov
Received:
24
August
1998
Revised:
20
November
1998
Published online: 15 April 1999
The cluster ion yields and cluster ion distribution for highly charged ion
sputtering have been measured for a uranium oxide target for 
, 
and 
incident ions. The cluster yields exhibit a power law dependence
on the cluster size with exponents increasing from -4 to -2.4 with increasing
primary ion charge from 44+ to 75+. The power law exponent is also correlated
with the total sputter yield.
PACS: 36.40.-c – Atomic and molecular clusters / 61.46.+w – Clusters, nanoparticles, and nanocrystalline materials / 82.65.-i – Surface and interface chemistry
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 1999
