Dependence of cluster ion emission from uranium oxide surfaces on the charge state of the incident slow highly charged ion
University of California, Lawrence Livermore National Laboratory, Livermore, CA 94551, USA
Corresponding author: a Hamza1@llnl.gov
Revised: 20 November 1998
Published online: 15 April 1999
The cluster ion yields and cluster ion distribution for highly charged ion sputtering have been measured for a uranium oxide target for , and incident ions. The cluster yields exhibit a power law dependence on the cluster size with exponents increasing from -4 to -2.4 with increasing primary ion charge from 44+ to 75+. The power law exponent is also correlated with the total sputter yield.
PACS: 36.40.-c – Atomic and molecular clusters / 61.46.+w – Clusters, nanoparticles, and nanocrystalline materials / 82.65.-i – Surface and interface chemistry
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 1999