https://doi.org/10.1140/epjd/s10053-026-01162-7
Research - Photon
High-power beyond extreme ultraviolet FEL radiation with flexible polarization at SHINE
Shanghai Advanced Research Institute, Chinese Academy of Sciences, 201210, Shanghai, China
a
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Received:
13
January
2026
Accepted:
4
April
2026
Published online:
3
May
2026
Abstract
Linac-based free-electron lasers (FELs) feature high brightness, narrow bandwidth, controllable polarization, and wide wavelength tunability. With the rapid development of superconducting radio-frequency technology, linacs can now operate at MHz-level repetition rates, enabling FELs with both high repetition rates and high average power. Beyond extreme ultraviolet (BEUV) radiation is of great interest for scientific research and industrial applications, especially for next-generation lithography. Owing to the main design parameters of SHINE, the generation of BEUV radiation is a natural capability of the facility. The BEUV characteristics at SHINE are investigated and its achievable performance as a high-average-power light source is evaluated. By applying undulator tapering to enhance the energy extraction efficiency, kilowatt-level BEUV radiation with controllable polarization is shown to be achievable. These results demonstrate that SHINE can provide a high-performance BEUV source, offering a realistic pathway toward a high-average-power light source for next-generation high-resolution lithography.
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© The Author(s), under exclusive licence to EDP Sciences, SIF and Springer-Verlag GmbH Germany, part of Springer Nature 2026
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
